Electrodeposition and characterization of Fe80Ga20 alloy films

• Published in: Electrochimica acta 2011-05, Vol.56 (14), p.5178-5183
• Main Authors: Iselt, D., Gaitzsch, U., Oswald, S., Fähler, S., Schultz, L., Schlörb, H.
• Format: Article
• Language: English
• Subjects: Applied sciences; Chemistry; Electrochemistry; Electrodeposition; Exact sciences and technology; Fe100−xGax; Galfenol; General and physical chemistry; Magnetostriction; Metallic coatings; Metals. Metallurgy; Production techniques; Study of interfaces; Surface treatment; Thin film
• ISSN: 0013-4686; 1873-3859
• DOI: 10.1016/j.electacta.2011.03.046

► Fe80Ga20 was electrochemically deposited from aqueous electrolyte on Pt buffer layer by choosing suitable deposition parameters and pre-conditions. ► First published work which present metallic, dense and homogenous FeGa films with oxygen content below 1at.%. ► Optimized films reach saturation magnetization values of up to 1.7T. Due to its high magnetostriction and good mechanical properties Fe80Ga20 is interesting for magnetostrictive microactuators and sensors. Here we use electrodeposition to grow Fe–Ga films onto Au and Pt coated Si substrates by potentiostatic and pulse potential deposition. Composition, microstructure and structure are analysed. The desired composition of Fe80Ga20 was obtained at −1.4VSCE and −1.5VSCE, respectively. The origin of low reproducibility and high oxygen content up to 50at.% is investigated. Optimum deposition conditions to achieve dense, homogeneous films with low oxygen content are identified. In these films the saturation magnetization reaches a maximum value of 1.7T confirming the high quality of electrodeposited films.