5 years of ambient pressure photoelectron spectroscopy (APPES) at the Swiss Light Source (SLS)

• Published in: Journal of electron spectroscopy and related phenomena 2017-04, Vol.216, p.1-16
• Main Authors: Olivieri, Giorgia, Giorgi, Javier B., Green, Richard G., Brown, Matthew A.
• Format: Article
• Language: English
• Subjects: Electrical double layer; In situ spectroscopy; Liquid microjet; Near edge X-ray absorption fine structure (NEXAFS); Surface potential; X-ray photoelectron spectroscopy (XPS)
• ISSN: 0368-2048; 1873-2526
• DOI: 10.1016/j.elspec.2017.01.003

•A review of the ongoing research using the APPES endstation of the Swiss Light Source is presented.•Research interests include the liquid-vapor, liquid-nanoparticle and vapor-solid interfaces.•An outlook to the next five years of research at the Swiss Light Source is presented. In March of 2012 an endstation dedicated to ambient pressure photoelectron spectroscopy (APPES) was installed at the Swiss Light Source (SLS) synchrotron radiation facility on the campus of the Paul Scherrer Institute (PSI). The endstation is mobile and operated at the vacuum ultraviolet (VUV), Surfaces/Interfaces: Microscopy (SIM) and Phoenix beamlines, which together afford a nearly continuous photon energy range from 5−8000eV. This broad energy range is by far the widest available to a single currently operational APPES endstation. During its first five years of operation this endstation has been used to address challenging fundamental problems in the areas of soft-matter colloidal nanoscience, environmental science and energy storage—research that encompasses the liquid-nanoparticle, liquid-vapor (or vacuum) and solid-vapor interfaces. Here we present select highlights of these results and offer an outlook to the next five years of APPES research at the SLS.