Trends in XPS instrumentation for industrial surface analysis and materials characterisation

• Published in: Journal of electron spectroscopy and related phenomena 2019-02, Vol.231, p.68-74
• Main Authors: Roberts, A.J., Moffitt, C.E.
• Format: Article
• Language: English
• Subjects: Ar cluster ion source; Ion scattering spectroscopy; UV-photoemission; X-ray photoelectron spectroscopy; XPS imaging
• ISSN: 0368-2048; 1873-2526
• DOI: 10.1016/j.elspec.2018.03.002

•Usage of XPS continues to expand, and has become a mainstay in industrial research laboratories.•Multi-technique capabilities correlate different analyses from the same location of the sample surface.•Developments in ion sources have revolutionized organic materials analysis and soft cleaning of surface contaminants without damaging the underlying structures.•Developments in XPS imaging capabilities allow lateral surface heterogeneity to be explored in reasonable timeframes. Commercially manufactured X-ray photoelectron spectrometers have been available for nearly five decades, and their implementation in industrial surface analysis and materials characterization laboratories is now widespread. Whilst the fundamentals and information derived from XPS in determining the surface chemistry remain unchanged, the XPS instrumentation has developed significantly. Here we provide a brief overview from an instrument manufacturers perspective of the research demands on XPS instrumentation and the related developments, and reveal the breadth of application with several industrially relevant examples utilizing the capabilities of modern, state-of-the-art spectrometers.