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Recovery of linear components: Reduced complexity autoencoder designs
Reducing dimensionality is a key preprocessing step in many data analysis applications to address the negative effects of the curse of dimensionality and collinearity on model performance and computational complexity, to denoise the data or to reduce storage requirements. Moreover, in many applicati...
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Published in: | Engineering applications of artificial intelligence 2022-03, Vol.109, p.104663, Article 104663 |
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Main Authors: | , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Reducing dimensionality is a key preprocessing step in many data analysis applications to address the negative effects of the curse of dimensionality and collinearity on model performance and computational complexity, to denoise the data or to reduce storage requirements. Moreover, in many applications it is desirable to reduce the input dimensions by choosing a subset of variables that best represents the entire set without any a priori information available. Unsupervised variable selection techniques provide a solution to this second problem. An autoencoder, if properly regularized, can solve both unsupervised dimensionality reduction and variable selection, but the training of large neural networks can be prohibitive in time sensitive applications. We present an approach called Recovery of Linear Components (RLC), which serves as a middle ground between linear and non-linear dimensionality reduction techniques, reducing autoencoder training times while enhancing performance over purely linear techniques. With the aid of synthetic and real world case studies, we show that the RLC, when compared with an autoencoder of similar complexity, shows higher accuracy, similar robustness to overfitting, and faster training times. Additionally, at the cost of a relatively small increase in computational complexity, RLC is shown to outperform the current state-of-the-art for a semiconductor manufacturing wafer measurement site optimization application. |
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ISSN: | 0952-1976 1873-6769 |
DOI: | 10.1016/j.engappai.2022.104663 |