ZnO thin films deposited by RF magnetron sputtering: Effects of the annealing and atmosphere conditions on the photocatalytic hydrogen production

• Published in: International journal of hydrogen energy 2018-05, Vol.43 (22), p.10301-10310
• Main Authors: Alfaro Cruz, M.R., Ceballos-Sanchez, O., Luévano-Hipólito, E., Torres-Martínez, L.M.
• Format: Article
• Language: English
• Subjects: Hydrogen production; Photocatalysis; RF sputtering; ZnO thin films
• ISSN: 0360-3199; 1879-3487
• DOI: 10.1016/j.ijhydene.2018.04.054

This work studied the effect of different annealing conditions of ZnO thin films grown by RF magnetron sputtering and their application as photocatalysts for hydrogen production without any sacrificial agent or co-catalyst. ZnO films were annealed in air, nitrogen, and argon atmospheres to study the effect of their physical properties in the photocatalytic activity. ZnO films showed high crystallinity and optical transparence of around 75–90% after annealing. Changes in composition and optical properties of the ZnO films were studied by x-ray photoelectron spectroscopy (XPS) and ellipsometry spectroscopy (SE), and results were correlated with the photocatalytic performance in hydrogen production. The highest photocatalytic hydrogen production was obtained with the ZnO thin film annealed in an air atmosphere with a result of 76 μmol. [Display omitted] •ZnO films were deposited by RF Magnetron Sputtering and used for H2 production.•The crystallinity influence in the optical properties of the films.•Films annealed in air atmosphere presented the highest photocatalytic H2 production.•The highest H2 production was associated with the presence of O2 deficiencies.