Structural, optical and electrical properties of amorphous carbon films deposited by pulsed unbalanced magnetron sputtering

Amorphous carbon (a-C) films were deposited by pulsed unbalanced magnetron sputtering method, the effects of substrate temperature on the structure, optical and electrical properties of the a-C films were investigated. It has been found that the sp3 fraction in the a-C films increases with increasin...

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Bibliographic Details
Published in:Optik (Stuttgart) 2015-04, Vol.126 (7-8), p.861-864
Main Authors: Dai, H.Y., Cheng, X.R., Wang, C.F., Xue, Y.C., Chen, Z.P.
Format: Article
Language:English
Subjects:
Amorphous carbon films
Optical and electrical properties
Substrate temperature
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Summary:Amorphous carbon (a-C) films were deposited by pulsed unbalanced magnetron sputtering method, the effects of substrate temperature on the structure, optical and electrical properties of the a-C films were investigated. It has been found that the sp3 fraction in the a-C films increases with increasing substrate temperature from 50 to 100°C, while decreases with increasing substrate temperature from 100 to 200°C. Optical and electrical measurements show that the refractive index, optical band gap and electrical resistivity are strongly dependent on the substrate temperature. The a-C films deposited at 100°C have higher refractive index, optical band gap and electrical resistivity. The possible reason for all the above observation was discussed. The results above are useful for the practical application of a-C films.
ISSN:0030-4026
1618-1336
DOI:10.1016/j.ijleo.2015.02.047