Influence of physical plasma etching treatment on optical and hydrophilic MgF2 thin film

In this study, MgF2 thin film was prepared on glass substrate by thermal evaporation method. After that surface of the MgF2 thin film was improved using physical plasma etching treatment by plasma enhanced chemical vapor deposition (PECVD) equipment. Structural properties and surface morphology and...

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Bibliographic Details
Published in:Optik (Stuttgart) 2018-05, Vol.161, p.1-7
Main Authors: Eshaghi, Akbar, Mesbahi, Morteza, Aghaei, Abbas Ali
Format: Article
Language:English
Subjects:
Optical properties
Plasma etching
Superhydrophilic properties
Thin films
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Summary:In this study, MgF2 thin film was prepared on glass substrate by thermal evaporation method. After that surface of the MgF2 thin film was improved using physical plasma etching treatment by plasma enhanced chemical vapor deposition (PECVD) equipment. Structural properties and surface morphology and roughness of the thin films were evaluated by GIXRD, FESEM and AFM, respectively. Also optical properties were investigated throughout measurement of transmission spectra and refractive index in visible region by use of UV/vis spectrometer and ellipsometer, respectively. Water contact angles of the surfaces were measured by water contact analyzer. Results of the research indicated that transparency of the MgF2 thin films remind without change and hydrophilic properties of the MgF2 thin films turned to superhydrophilic properties after physical plasma etching treatment.
ISSN:0030-4026
1618-1336
DOI:10.1016/j.ijleo.2018.02.029