Microfocus-infrared synchrotron ellipsometer for mapping of ultra thin films

A purpose-build infrared spectroscopic ellipsometer is presented that enables to investigate sample areas of less than 1 mm 2 with monolayer sensitivity. This sensitivity is achieved for films on metallic as well as on semiconducting substrates. Measurement principle and performance of the instrumen...

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Bibliographic Details
Published in:Infrared physics & technology 2006-09, Vol.49 (1), p.74-77
Main Authors: Gensch, M., Korte, E.H., Esser, N., Schade, U., Hinrichs, K.
Format: Article
Language:English
Subjects:
Anisotropy
Ellipsometry
Exact sciences and technology
Infrared
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Mapping
Optical instruments, equipment and techniques
Organic thin films
Physics
Polarimeters and ellipsometers
Polymer
Silicon
Synchrotron radiation
Synchrotron radiation instrumentation
X- and γ-ray instruments and techniques
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Description
Summary:A purpose-build infrared spectroscopic ellipsometer is presented that enables to investigate sample areas of less than 1 mm 2 with monolayer sensitivity. This sensitivity is achieved for films on metallic as well as on semiconducting substrates. Measurement principle and performance of the instrument are discussed on selected examples and an outline of the currently performed upgrading of the set-up is given.
ISSN:1350-4495
1879-0275
DOI:10.1016/j.infrared.2006.01.007