Morphological characteristics of Ni sulfides fabricated by chemical vapor deposition

Ni sulfides were formed by reacting Ni substrates with gaseous sulfur, and then their microstructures were investigated. Ni sulfides consisted of four distinct layers, i.e., the topmost thin film layer (I), dense thick film layer (II), coarse particulate layer (III), and innermost fine particulate l...

Full description

Saved in:
Bibliographic Details
Published in:Journal of alloys and compounds 2009-05, Vol.477 (1), p.L24-L27
Main Authors: Cho, Gyu-bong, Bae, Kang-woo, Nam, Tae-hyun, Lee, Jun-hee
Format: Article
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
CVD
Electrochemical reaction
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Morphology
Ni sulfides
Physics
Structure and morphology
thickness
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Ni sulfides were formed by reacting Ni substrates with gaseous sulfur, and then their microstructures were investigated. Ni sulfides consisted of four distinct layers, i.e., the topmost thin film layer (I), dense thick film layer (II), coarse particulate layer (III), and innermost fine particulate layer (IV). XRD and electrochemical analyses demonstrated that layers I, II and IV were NiS 2, NiS and Ni 3S 2, respectively and layer III was a transient layer where Ni 3S 2 was converted into NiS by Ni 3S 2 + S → NiS reaction.
ISSN:0925-8388
1873-4669
DOI:10.1016/j.jallcom.2008.10.128