A comparative study on the electrical characteristics of Au/n-Si structures with anatase and rutile phase TiO2 interfacial insulator layer

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Bibliographic Details
Published in:Journal of alloys and compounds 2010-09, Vol.505 (2), p.628-633
Main Authors: BENGI, A, AYDEMIR, U, ALTINDAL, S, ÖZEN, Y, ÖZCELIK, S
Format: Article
Language:English
Subjects:
Cold working, work hardening
annealing, quenching, tempering, recovery, and recrystallization
textures
Cross-disciplinary physics: materials science
rheology
Deposition by sputtering
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Treatment of materials and its effects on microstructure and properties
Vapor phase epitaxy
growth from vapor phase
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ISSN:0925-8388
1873-4669
DOI:10.1016/j.jallcom.2010.06.095