Sequential microcontroller-based control for a chemical vapor deposition process

A cost-effective direct liquid injection system is developed for a chemical vapor deposition process using a microcontroller. The precursor gas phase is controlled by the precise sequential injection of a liquid precursor solution to a vaporizing chamber prior deposition. The electronic control syst...

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Bibliographic Details
Published in:Journal of applied research and technology 2017-12, Vol.15 (6), p.593-598
Main Authors: Pérez, Edgar Serrano, Pérez, Javier Serrano, Piñón, Fernando Martínez, García, José Manuel Juárez, Pérez, Omar Serrano, López, Fernando Juárez
Format: Article
Language:English
Subjects:
Chemical vapor deposition
Direct liquid injection
Microcontroller
Thin films
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Summary:A cost-effective direct liquid injection system is developed for a chemical vapor deposition process using a microcontroller. The precursor gas phase is controlled by the precise sequential injection of a liquid precursor solution to a vaporizing chamber prior deposition. The electronic control system allows the human–machine interface through a LCD display and a keypad matrix. The core of the electronic system is based on an electro mechanical injector operated in time and frequency as a sequential control system by a popular PIC16F877A chip. The software has been developed in the BASIC language and it can be easily modified through an ICSP programmer for different sequential automatized routines. The injection calibration test has proven the linearity of the injection control system for different operation parameters. The results reported the sequential injection MOCVD deposition of alumina thin film.
ISSN:1665-6423
DOI:10.1016/j.jart.2017.07.003