Catalityc effects of ruthenium and osmium spontaneous deposition on platinum surfaces toward methanol oxidation

The influence of ruthenium and osmium spontaneous deposition on polycrystalline platinum in sulfuric acid was studied by conventional electrochemical techniques. The inhibition of the hydrogen adatom voltammetric profile by the foreign adatoms was used to calculate the degree of surface coverage of...

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Bibliographic Details
Published in:Journal of colloid and interface science 2005-08, Vol.288 (2), p.377-386
Main Authors: Bonilla, S.H., Zinola, C.F., Rodríguez, J., Díaz, V., Ohanian, M., Martínez, S., Giannetti, B.F.
Format: Article
Language:English
Subjects:
Chemistry
Electrocatalysis
Electrochemistry
Exact sciences and technology
General and physical chemistry
Kinetics and mechanism of reactions
Osmium
Platinum
Ruthenium
Voltammetry
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Summary:The influence of ruthenium and osmium spontaneous deposition on polycrystalline platinum in sulfuric acid was studied by conventional electrochemical techniques. The inhibition of the hydrogen adatom voltammetric profile by the foreign adatoms was used to calculate the degree of surface coverage of ruthenium, osmium, and a mixture of both metal ions from solutions of different composition. Methanol adsorption and oxidation were compared on bare platinum, platinum/ruthenium, platinum/osmium, and ternary compounds, considering the efficiency of methanol oxidation per hydrogen adatom displaced by the foreign metal on platinum.
ISSN:0021-9797
1095-7103
DOI:10.1016/j.jcis.2005.03.039