Structural fabrication and defect-dependent optical transmission of dielectric multilayer films

We present the structural fabrication and the optical transmission of dielectric multilayer films with a defect both theoretically and experimentally. With the transfer-matrix method, the transmission of electromagnetic waves through the multilayer can be theoretically analyzed. It is shown that a d...

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Bibliographic Details
Published in:Journal of crystal growth 2005-02, Vol.275 (1), p.e1209-e1214
Main Authors: Wang, Z., Peng, R.W., Qiu, F., Tang, Z.H., Hu, X.F., Huang, X.Q., Wang, Mu, Hu, A., Jiang, S.S., Feng, D.
Format: Article
Language:English
Subjects:
B2. Dielectric materials
B3. Filters
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Summary:We present the structural fabrication and the optical transmission of dielectric multilayer films with a defect both theoretically and experimentally. With the transfer-matrix method, the transmission of electromagnetic waves through the multilayer can be theoretically analyzed. It is shown that a defect layer in the structure can induce the localized mode that is shown as the transmission peak in the photonic band gap (PBG). Both the intensity and the quality factor of the peak definitely change with adjusting the position of the defect in the multilayer. Further, the number of transmission peaks in the PBG can be tuned by changing the thickness of the defect layer. In the experiment, a series of TiO 2 / SiO 2 multilayer films with the defect layer HfO 2 have been fabricated using the electron-gun evaporation technique. Optical measurements are in good agreement with theoretical predictions. The investigation achieves the possible application to the wavelength division multiplexing system.
ISSN:0022-0248
1873-5002
DOI:10.1016/j.jcrysgro.2004.11.142