Nondestructive characterization of various thin films using a near-field scanning millimeter-wave microscope

We demonstrate a nondestructive millimeter-wave surface imaging technique using a near-field scanning millimeter-wave microscope (NSMM) with a resonant standard waveguide probe at an operation frequency f = 30 – 39 GHz . A chemically etched metallic probe tip, was coupled to the resonant rectangular...

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Bibliographic Details
Published in:Journal of crystal growth 2005-02, Vol.275 (1), p.e1869-e1873
Main Authors: Yoo, Hyunjun, Kim, Miewha, Kim, Hyun, Yang, Jongil, Kim, Songhui, Lee, Kiejin, Friedman, Barry
Format: Article
Language:English
Subjects:
A1. Characterization
A1. Near-field scanning millimeterwave microscope
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Summary:We demonstrate a nondestructive millimeter-wave surface imaging technique using a near-field scanning millimeter-wave microscope (NSMM) with a resonant standard waveguide probe at an operation frequency f = 30 – 39 GHz . A chemically etched metallic probe tip, was coupled to the resonant rectangular waveguide. By properly tuning the tunable resonator and the probe tip, we could improve sensitivity and spatial resolution of the NSMM. Measuring the change of the reflection coefficient S 11 in the near-field zone, sheet resistance changes of Ag, ITO, YBa 2Cu 3O y , organic copper(II) phthalocyanine (Cu–Pc) thin films, and MgO were obtained. We observed the NSMM images of Ag thin film on the glass substrate with a spatial resolution better than 2 μm.
ISSN:0022-0248
1873-5002
DOI:10.1016/j.jcrysgro.2004.11.280