X-rays diffraction on a new chromium oxide single-crystal thin film prepared by molecular beam epitaxy

• Published in: Journal of crystal growth 2006-07, Vol.293 (1), p.228-232
• Main Authors: Du, X.S., Hak, S., Hibma, T., Rogojanu, O.C., Struth, B.
• Format: Article
• Language: English
• Subjects: A1. Characterization; A1. Crystal structure; A1. X-ray diffraction; A3. Molecular beam epitaxy; B1. Oxide; Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Molecular, atomic, ion, and chemical beam epitaxy; Physics
• ISSN: 0022-0248; 1873-5002
• DOI: 10.1016/j.jcrysgro.2006.05.013

Chromium oxide films were prepared on MgO substrates by molecular beam epitaxy. The crystalline structure of the films was characterized by X-ray diffraction (XRD) with conventional as well as synchrotron X-ray sources. The θ−2 θ spectra showed that the film was a new chromium oxide epitaxially grown on MgO(0 0 1) substrate. The structure of the film was revealed to be body-centred orthorhombic both by reciprocal space mapping and synchrotron Q scans. The unit cell parameters were determined to be a=8.94, b=2.98 and c=3.892 Å. The film had a 45° in-plane orientation with respect to MgO substrate. The crystalline structure of the films was equivalent to a NaCl-type CrO with 1 3 Cr atoms vacating along MgO〈1 1 0〉 direction in an ordered way.