Epitaxial Ni films, e-beam nano-patterning and BMR

We have attempted to clarify possible domain-wall processes present in the recently reported large ballistic magnetoresistance effects in nano-contacts. To that effect we have used e-beam lithography applied to epitaxial Ni films to fabricate nano-bridges in more controlled geometry than electrochem...

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Bibliographic Details
Published in:Journal of magnetism and magnetic materials 2004-05, Vol.272, p.1864-1865
Main Authors: Lukaszew, R.Alejandra, Zhang, Zhengdong, Pearson, Dave, Zambano, Antonio
Format: Article
Language:English
Subjects:
Epitaxy
Magnetic films
Magnetoresistance
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Summary:We have attempted to clarify possible domain-wall processes present in the recently reported large ballistic magnetoresistance effects in nano-contacts. To that effect we have used e-beam lithography applied to epitaxial Ni films to fabricate nano-bridges in more controlled geometry than electrochemical deposition. Our preliminary results indicate that magnetic domains do play a role in the magneto-resistance of these nano-bridges but the order of magnitude of the observed effect is considerably smaller than the reported observations in electrochemically prepared nano-contacts.
ISSN:0304-8853
DOI:10.1016/j.jmmm.2003.12.1132