Structural Morphological and Optical Properties of SnSb2S4 Thin Films Grown by Vacuum Evaporation Method

• Published in: Journal of materials science & technology 2014-10, Vol.30 (10), p.1006-1011
• Main Authors: Khedmi, N., Ben Rabeh, M., Kanzari, M.
• Format: Article
• Language: English
• Subjects: Atomic force microscopy (AFM); Ternary system; Thermal evaporation technique; Thickness; Thin films; X射线衍射分析; 光学性能; 微晶尺寸; 微观结构参数; 玻璃基板; 真空蒸镀法; 结构形态; 薄膜厚度
• ISSN: 1005-0302; 1941-1162
• DOI: 10.1016/j.jmst.2014.03.019

SnSb2S4 thin films were prepared from powder by thermal evaporation under vacuum of 1.33 × 10^-4 Pa （ 10^-6 Torr） on unheated glass substrates. The effect of thickness on the structural, morphological and optical properties of SnSb2S4 thin films was investigated. Films thickness measured by interference fringes method varied from 50 to 700 nm. X-ray diffraction analysis revealed that all the SnSb2S4 films were polycrystalline in spite without heating the substrates and the crystallinity was improved with increasing film thickness. The microstructure parameters： crystallite size, strain and dislocation density were calculated. It was observed that the crystallite size increased and the crystal defects decreased with increasing film thickness. In addition, by increasing the film thickness, an enhancement in the surface roughness root-mean-square （RMS） increased from 2.0 to 6.6 nm. The fundamental optical parameters like band gap, absorption and extinction coefficient were calculated in the strong absorption region of transmittance and reflectance spectrum. The optical absorption measurements indicated that the band （Eg） gap of the thin films decreased from 2.10 to 1.65 eV with increasing film thickness. The refractive indexes were evaluated in transparent region in terms of envelope method, which was suggested by Swanepoul. It was observed that the refractive index increased with increasing film thickness.