Low frequency plasma deposition and characterization of Si1−xGex:H,F films

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Bibliographic Details
Published in:Journal of non-crystalline solids 2004-06, Vol.338-340, p.91-96
Main Authors: Ambrosio, R., Torres, A., Kosarev, A., Ilinski, A., Zúñiga, C., Abramov, A.S.
Format: Article
Language:English
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ISSN:0022-3093
DOI:10.1016/j.jnoncrysol.2004.02.028