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Transport properties of nanocrystalline silicon and silicon–germanium
We report on the minority carrier lifetime, diffusion length and mobility in nanocrystalline Si and (Si,Ge) p+nn+ devices. The devices were fabricated on stainless steel using VHF plasma deposition techniques. Minority carrier lifetime was measured using junction reverse recovery techniques. The min...
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Published in: | Journal of non-crystalline solids 2008-05, Vol.354 (19-25), p.2426-2429 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | We report on the minority carrier lifetime, diffusion length and mobility in nanocrystalline Si and (Si,Ge) p+nn+ devices. The devices were fabricated on stainless steel using VHF plasma deposition techniques. Minority carrier lifetime was measured using junction reverse recovery techniques. The minority carrier lifetime was found to be well correlated with the inverse of defect density and increased with increasing measurement temperature. Simultaneous measurement of diffusion length and lifetime yielded values for hole mobility. |
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ISSN: | 0022-3093 1873-4812 |
DOI: | 10.1016/j.jnoncrysol.2007.10.060 |