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Structural analysis of Cd–Te–O films prepared by RF reactive sputtering
Crystalline and microcrystalline Cd–Te–O samples have been obtained by RF reactive sputtering from a CdTe target using N 2O as oxidant. The growth conditions were substrate temperatures of 323 K, 573 K and 773 K and cathode voltage of −400 V, corresponding to 30 W of forward power. The samples were...
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Published in: | Journal of non-crystalline solids 2008-08, Vol.354 (31), p.3756-3761 |
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Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Crystalline and microcrystalline Cd–Te–O samples have been obtained by RF reactive sputtering from a CdTe target using N
2O as oxidant. The growth conditions were substrate temperatures of 323
K, 573
K and 773
K and cathode voltage of −400
V, corresponding to 30
W of forward power. The samples were studied by micro-Raman spectroscopy, X-ray diffraction and optical transmittance. The films are remarkably transparent in the visible range, with transmittances about 88% at 400
nm and band gap energies above the absorption edge of the glass substrates. Although only the samples prepared at 773
K present defined diffraction peaks, the analysis of the Raman spectra indicate that samples prepared at 323
K and 573
K have a defined microstructure indeed. The spectra fitting performed by comparison with pattern compounds demonstrate that Cd–Te–O films are formed of Te–O units similar to those present in metal oxide-doped tellurite glasses, such as TeO
3 and TeO
3
+
1
linked through Cd–O bonds. As the substrate temperature increases the microstructure evolves from a γ-TeO
2 richer state to Cd
x
Te
y
O
z
. In the crystalline sample the main phase identified was CdTeO
3 even though evidence of other phases was observed. |
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ISSN: | 0022-3093 1873-4812 |
DOI: | 10.1016/j.jnoncrysol.2008.03.042 |