Sputtering of W and Al in D2/O2 plasma cleaning discharge

Ion sputtering of W, Al, and Be (in several experiments) in a low pressure DC discharge in D2/O2 mixtures was studied. Ion energy was varied by electrical biasing of the samples from −100 to −600V with respect to the plasma. At a bias of −100V the sputtering yields peaked with an addition of 2–4mol....

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Bibliographic Details
Published in:Journal of nuclear materials 2015-08, Vol.463, p.255-257
Main Authors: Bukhovets, V.L., Gorodetsky, A.E., Zalavutdinov, R.Kh, Zakharov, A.P., Mukhin, E.E., Razdobarin, A.G.
Format: Article
Language:English
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Summary:Ion sputtering of W, Al, and Be (in several experiments) in a low pressure DC discharge in D2/O2 mixtures was studied. Ion energy was varied by electrical biasing of the samples from −100 to −600V with respect to the plasma. At a bias of −100V the sputtering yields peaked with an addition of 2–4mol.% oxygen reaching (4±0.5)×10−3, (12±1)×10−3, and (20±2)×10−3Meat./ion for W, Al, and Be, respectively. It is supposed that chemical nature of W, Al, and Be sputtering in D2/O2 plasma is caused by formation of weakly bound surface oxides and hydroxides under impinging of reactive deuterated ions (D3O+, D3+).
ISSN:0022-3115
1873-4820
DOI:10.1016/j.jnucmat.2014.12.059