Photo-induced self-cleaning and biocidal behaviour of titania and copper oxide multilayers

This paper describes the deposition of films of titania and copper oxide by atmospheric pressure chemical vapour deposition (CVD). The films were investigated as part of multilayer systems to assess their potential to offer the dual functionality of self-cleaning and biocidal films. The multilayer s...

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Bibliographic Details
Published in:Journal of photochemistry and photobiology. A, Chemistry. Chemistry., 2008-06, Vol.197 (2), p.197-205
Main Authors: Yates, H.M., Brook, L.A., Ditta, I.B., Evans, P., Foster, H.A., Sheel, D.W., Steele, A.
Format: Article
Language:English
Subjects:
Biocidal
Chemical vapour deposition
Copper oxide
Photo-activity
Titania
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Summary:This paper describes the deposition of films of titania and copper oxide by atmospheric pressure chemical vapour deposition (CVD). The films were investigated as part of multilayer systems to assess their potential to offer the dual functionality of self-cleaning and biocidal films. The multilayer systems were achieved by deposition of copper oxide with subsequent titanium dioxide deposition and vice versa. Two different CVD approaches were employed in combination, thermal CVD and flame-assisted CVD. It is shown that by careful choice of the experimental growth conditions, multilayers can be formed with both biocidal and ‘self-clean’ functionality under UV photo-induced conditions.
ISSN:1010-6030
1873-2666
DOI:10.1016/j.jphotochem.2007.12.023