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Electrical, optical and structural properties of aluminum doped cadmium oxide thin films prepared by spray pyrolysis technique

Transparent conducting aluminum doped cadmium oxide (CdO:Al) thin films were deposited by spray pyrolysis method on glass substrates for various concentrations of aluminum (1–5 wt.%). CdO:Al films were characterized using different techniques such as X-ray diffraction (XRD), atomic force microscopy,...

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Bibliographic Details
Published in:Materials chemistry and physics 2010-08, Vol.122 (2), p.444-448
Main Authors: Kumaravel, R., Menaka, S., Snega, S. Regina Mary, Ramamurthi, K., Jeganathan, K.
Format: Article
Language:English
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Summary:Transparent conducting aluminum doped cadmium oxide (CdO:Al) thin films were deposited by spray pyrolysis method on glass substrates for various concentrations of aluminum (1–5 wt.%). CdO:Al films were characterized using different techniques such as X-ray diffraction (XRD), atomic force microscopy, optical transmittance and Hall measurement. XRD analysis showed that CdO films exhibit cubic crystal structure with (2 0 0) preferred orientation. A minimum resistivity of 3.4 × 10 −4 Ω cm with carrier concentration of 4.12 × 10 20 cm −3 is achieved when the CdO film is doped with 3 wt.% Al. The band gap value increases with doping and reaches a maximum of 2.53 eV when doping level is 3 wt.% and then decreases for higher Al doping concentration.
ISSN:0254-0584
1879-3312
DOI:10.1016/j.matchemphys.2010.03.022