The effect of different etching modes on the smoothing of the rough surfaces

• Published in: Materials letters 2012-11, Vol.86, p.165-167
• Main Authors: Radjenović, B., Radmilović-Radjenović, M.
• Format: Article
• Language: English
• Subjects: Etching modes; materials; Roughness; Simulation; Smoothing; surface roughness; surfaces
• ISSN: 0167-577X; 1873-4979
• DOI: 10.1016/j.matlet.2012.07.068

This letter presents a study on the influence of the three different etching modes (isotropic, anisotropic and sputtering) on the dynamics of smoothing of roughed surfaces. Calculations were performed using a three-dimensional simulation package based on the level set method. The obtained simulation results clearly show that the surface roughness could be reduced by both the sputtering and the isotropic etching, although the sputtering process is much more efficient. On the other hand, it is shown that the anisotropic etching is not an effective mechanism of smoothing. The time dependence of the interface width is analyzed and growth exponent β has been determined for all etching modes. ►Effect of three different etching modes (isotropic, anisotropic and sputtering) on the dynamics of smoothing of roughed surfaces. ► Surface roughness can be reduced by both sputtering and isotropic etching, although the sputtering process is much more efficient. ► Anisotropic etching is not an effective mechanism of smoothing. ► Time dependence of the interface width is analyzed and growth exponent has been determined for all etching modes. ► For the first time, a scaling law for the smoothing process has been suggested.