Synthesis of Graphene-layer Nanosheet Coatings by PECVD

Plasma enhanced chemical vapor deposition (PECVD) is a potentially industrially scalable route for graphene synthesis. Thin carbon coatings were deposited by PECVD from C2H2 and post-deposition irradiated by Ar+. Irradiation with 400eV accelerated Ar+, deposition temperatures of 400°C and post depos...

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Bibliographic Details
Main Authors: Kaindl, Reinhard, Jakopic, Georg, Resel, Roland, Pichler, Jeanine, Fian, Alexander, Fisslthaler, Evelin, Grogger, Werner, Bayer, Bernhard C., Fischer, Roland, Waldhauser, Wolfgang
Format: Conference Proceeding
Language:English
Subjects:
graphene
graphite
physical vapor deposition
plasma enhanced chemical vapor deposition
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Summary:Plasma enhanced chemical vapor deposition (PECVD) is a potentially industrially scalable route for graphene synthesis. Thin carbon coatings were deposited by PECVD from C2H2 and post-deposition irradiated by Ar+. Irradiation with 400eV accelerated Ar+, deposition temperatures of 400°C and post deposition annealing up to 800°C result in crystal growth and graphitization, i.e. increased fraction of C-C sp2 bonding. The same effect is achieved by deposition on copper and nickel foils, and interestingly on NaCl. For irradiated samples a two-layer graphene-layer nanosheet morphology is indicated from our characterization, with a variation of film properties across the film thickness.
ISSN:2214-7853
2214-7853
DOI:10.1016/j.matpr.2015.09.010