Technological scheme of mechanical and chemical treatment of PbTe and Pb1−xSnxTe solid solutions for obtaining polished surface of single crystal

The methods of preliminary and finishing treatment of PbTe and Pb1−xSnxTe solid solutions, such as free abrasive mechanical polishing and chemical polishing of semiconductor wafer surfaces with developed bromine emerging etchants, have been developed and improved. The morphology of the surface befor...

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Bibliographic Details
Main Authors: Malanych, G.P., Stanetska, A.S., Stratiychuk, I.B., Tomashyk, V.M.
Format: Conference Proceeding
Language:English
Subjects:
Chemical etching
Chemical-mechanical polishing
Pb1−xSnxTe solid solution
Single crystal
Ultra-smooth surface
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Summary:The methods of preliminary and finishing treatment of PbTe and Pb1−xSnxTe solid solutions, such as free abrasive mechanical polishing and chemical polishing of semiconductor wafer surfaces with developed bromine emerging etchants, have been developed and improved. The morphology of the surface before and after chemical etching has been investigated. Chemical treatment of the crystal surfaces with etchant mixtures allows to obtain ultra-smooth surfaces with Ra = 0.8 ÷ 5 nm.
ISSN:2214-7853
2214-7853
DOI:10.1016/j.matpr.2019.10.055