Integrating spin-based technologies with atomically controlled van der Waals interfaces

[Display omitted] As the feature sizes of electronic devices continue to shrink, new technologies—in particular spintronics and derived interfacial architectures—become increasingly pivotal. In this context, two-dimensional van der Waals materials and their interfaces are particularly attractive, re...

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Bibliographic Details
Published in:Materials today (Kidlington, England) England), 2021-12, Vol.51, p.350-364
Main Authors: Zhang, Wen, Wong, Ping Kwan Johnny, Jiang, Sheng, Chen, Qian, Huang, Wei, Wee, Andrew Thye Shen
Format: Article
Language:English
Subjects:
Interface
Magnetism
Molecular beam epitaxy
Spintronics
van der Waals
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Summary:[Display omitted] As the feature sizes of electronic devices continue to shrink, new technologies—in particular spintronics and derived interfacial architectures—become increasingly pivotal. In this context, two-dimensional van der Waals materials and their interfaces are particularly attractive, relying on their ultimate atomic thicknesses and exceptional spin-related properties. This review provides a critical evaluation on the state-of-the-art of van der Waals interfaces and projected technological applications in spintronics, highlights major challenges and a viable solution—an all-in-situ growth and characterization strategy, and finally identifies several emerging spin-based technologies that might significantly benefit from the versatile van der Waals interfaces enabled by the strategy.
ISSN:1369-7021
1873-4103
DOI:10.1016/j.mattod.2021.09.015