N2 effect on GaAs etching at 150mTorr capacitively-coupled Cl2/N2 plasma

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Bibliographic Details
Published in:Microelectronic engineering 2010-04, Vol.87 (4), p.548-552
Main Authors: Park, Y.H., Kim, J.K., Lee, J.H., Joo, Y.W., Noh, H.S., Lee, J.W., Pearton, S.J.
Format: Article
Language:English
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ISSN:0167-9317
DOI:10.1016/j.mee.2009.08.006