Challenges in using optical lithography for the building of a 22nm node 6T-SRAM cell

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Bibliographic Details
Published in:Microelectronic engineering 2010-05, Vol.87 (5-8), p.993-996
Main Authors: Ercken, M., Altamirano-Sanchez, E., Baerts, C., Brus, S., De Backer, J., Delvaux, C., Demand, M., Horiguchi, N., Locorotondo, S., Vandeweyer, T., Veloso, A., Verhaegen, S.
Format: Article
Language:eng ; jpn
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ISSN:0167-9317
DOI:10.1016/j.mee.2009.11.119