Extreme UV diffraction grating fabricated by nanoimprint lithography

• Published in: Microelectronic engineering 2012-10, Vol.98, p.194-197
• Main Authors: Lin, Chun-Hung, Lin, Yi-Ming, Liang, Chia-Ching, Lee, Yin-Yu, Fung, Hok-Sum, Shew, Bor-Yuan, Chen, Szu-Hung
• Format: Article
• Language: English
• Subjects: Applied sciences; Cross-disciplinary physics: materials science; rheology; Diffraction grating; Electronics; EUV interference lithography; Exact sciences and technology; Fundamental areas of phenomenology (including applications); Gratings; Materials science; Methods of nanofabrication; Microelectronic fabrication (materials and surfaces technology); Nanoimprint; Nanoscale pattern formation; Optical elements, devices, and systems; Optics; Physics; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Surface treatments
• ISSN: 0167-9317; 1873-5568
• DOI: 10.1016/j.mee.2012.07.037

[Display omitted] ► The patterning steps of grating pattern and stop layer are separated. ► The grating patterning can be more efficient by using nanoimprint lithography. ► The imprinted SU-8 grating can function as the EUV diffraction grating directly. In this study, extreme ultraviolet (EUV) diffraction gratings were fabricated by nanoimprint lithography owing to its advantages of being low cost and high throughput. The imprinted SU-8 grating can function as the EUV diffraction grating directly without the need of the additional lift-off process. The patterning steps of grating pattern and stop layer were separated to enhance 0th order blocking capability of the stop layer. The exposure results of the one-dimensional 75 and 50nm half-pitch PMMA line/space patterns from the fabricated gratings were demonstrated.