A virtual lateral standard for AFM calibration

• Published in: Microelectronic engineering 2016-03, Vol.153, p.29-36
• Main Authors: Koops, Richard, van Veghel, Marijn, van de Nes, Arthur
• Format: Article
• Language: English
• Subjects: Lateral AFM calibration; Measurement uncertainty; Nanoscale production; Non-linearity; Traceability; Virtual standard
• ISSN: 0167-9317; 1873-5568
• DOI: 10.1016/j.mee.2016.01.010

Calibration of the lateral scale of scanning probe microscopes using conventional physical calibration standards (i.e. 1D or 2D gratings) has limitations for small scanning ranges imposed by the pitch of the standards. Below approximately 1μm the number of features on the standards that can be imaged is limited and the effects of imperfections from individual features increase the calibration uncertainty. Additionally, the standards consist of delicate nanostructures that are susceptible to contamination and damage. Due to this delicate nature these standards are less useful in a production environment. We present a lateral calibration method based on a virtual standard that is robust to contamination and damage and also enables the determination of scanner non-linearity. In contrast to conventional physical standards the accuracy of the virtual standard does not decrease for smaller scan ranges. The standard is based on a highly linear shear piezo and has no specific requirements for the surface texture that is used during the lateral calibration. The calibration of the shear piezo in the range from 2pm to 20nm with a dedicated interferometer and its application as an accurate virtual standard to calibrate the lateral scale and non-linearity of an atomic force microscope will be discussed. [Display omitted]