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Analysis of the subthreshold characteristics in AlGaN/GaN HEMTs with a p-GaN gate

In this letter, we analyze the subthreshold characteristics in p-GaN/AlGaN/GaN high electron mobility transistors (HEMTs) with two different Mg flow, i.e., 300 sccm and 750 sccm. The device with 750 sccm Mg flow shows a high threshold voltage and large subthreshold swing (SS). The frequency dependen...

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Published in:Microelectronics and reliability 2021-11, Vol.126, p.114302, Article 114302
Main Authors: Tang, Shun-Wei, Chen, Szu-Chia, Wu, Tian-Li
Format: Article
Language:English
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Summary:In this letter, we analyze the subthreshold characteristics in p-GaN/AlGaN/GaN high electron mobility transistors (HEMTs) with two different Mg flow, i.e., 300 sccm and 750 sccm. The device with 750 sccm Mg flow shows a high threshold voltage and large subthreshold swing (SS). The frequency dependent C-V measurement is reported in p-GaN/AlGaN/GaN heterostructure, showing an obvious frequency dispersion in the device with a high Mg flow. Furthermore, the equivalent circuit network with considering the series of a Schottky metal/p-GaN junction capacitor (CSchottky) and the AlGaN barrier capacitor (CAlGaN) is proposed to calculate the interface state density (Dit) via the conduction method. Finally, a strong correlation between SS, Dit and Mg flow can be concluded, pointing out that the optimization of Mg out-diffusion in p-GaN is crucial to improve the subthreshold characteristics. •The subthreshold characteristics in p-GaNHEMTs with two different Mg flow, i.e., 300 sccm and 750 sccm, are analyzed.•The frequency dependent C–V measurement shows an obvious frequency dispersion in the device with a high Mg flow.•The equivalent circuit network is proposed to calculate the interface state density (Dit) via the conduction method.•A strong correlation between SS, Dit and Mg flow can be concluded.
ISSN:0026-2714
1872-941X
DOI:10.1016/j.microrel.2021.114302