Mixed phase silicon thin films grown at high rate using 60 MHz assisted VHF-PECVD technique

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Bibliographic Details
Published in:Materials science in semiconductor processing 2015-12, Vol.40, p.11-19
Main Authors: Juneja, Sucheta, Sudhakar, S., Gope, Jhuma, Kumar, Sushil
Format: Article
Language:English
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ISSN:1369-8001
DOI:10.1016/j.mssp.2015.06.046