Fabrication of Au gratings by seedless electroplating for X-ray grating interferometry

High quality gratings are among the key elements for successful imaging with X-ray grating interferometry. Grating fabrication, specifically of absorption gratings, with high aspect ratio and large area, is a great challenge from a microfabrication point of view. In this paper the fabrication of abs...

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Bibliographic Details
Published in:Materials science in semiconductor processing 2019-03, Vol.92, p.73-79
Main Authors: Kagias, Matias, Wang, Zhentian, Guzenko, Vitaliy A., David, Christian, Stampanoni, Marco, Jefimovs, Konstantins
Format: Article
Language:English
Subjects:
Deep reactive ion etching
Electroplating
Grating fabrication
X-ray interferometry
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Summary:High quality gratings are among the key elements for successful imaging with X-ray grating interferometry. Grating fabrication, specifically of absorption gratings, with high aspect ratio and large area, is a great challenge from a microfabrication point of view. In this paper the fabrication of absorption gratings by seedless electroplating of gold in high aspect ratio silicon moulds that are fabricated by deep reactive ion etching (Bosch process) is presented. We report on our latest results and discuss the possibility of reducing the grating period down to 1.3μm. In addition, the quality of the gratings is assessed by performing visibility measurements and imaging various samples on a compact in house X-ray grating interferometer.
ISSN:1369-8001
1873-4081
DOI:10.1016/j.mssp.2018.04.015