The preparation and investigation of all thin film electrochromic devices based on reactively sputtered MoO3 thin films

Reactively sputtered molybdenum trioxide (MoO3) thin films were systematically investigated and employed as cathodic electrochromic layers in all thin film electrochromic devices (ATF-ECDs). The gas loop controller was employed for adjustment of inputted oxygen gas flux by monitoring the target volt...

Full description

Saved in:
Bibliographic Details
Published in:Materials science in semiconductor processing 2021-05, Vol.126, p.105686, Article 105686
Main Authors: Han, Qiaonan, Wang, Rui, Zhu, Hongbing, Wan, Meixiu, Mai, Yaohua
Format: Article
Language:English
Subjects:
Electrochromic device
MoO3 thin film
Reactive magnetron sputtering
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Reactively sputtered molybdenum trioxide (MoO3) thin films were systematically investigated and employed as cathodic electrochromic layers in all thin film electrochromic devices (ATF-ECDs). The gas loop controller was employed for adjustment of inputted oxygen gas flux by monitoring the target voltage during reactive sputtering. The working pressure played a great role on the deposition rate, crystallite size, optical properties and the electrochromic properties of MoO3 and the applied ATF-ECDs (soda lime glass (SLG)/ITO/NiOX/Ta2O5/MoO3/ITO). A 4 Pa MoO3 based ATF-ECD achieved a high optical modulation (transmission @ 600 nm) of ~50% and a high coloration efficiency of 149.4 cm2/C.
ISSN:1369-8001
1873-4081
DOI:10.1016/j.mssp.2021.105686