Low contact-resistivity and high-uniformity Ni/Au ohmic contacts on Si nanomembranes grafted to Si substrates via low-temperature rapid thermal annealing

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Bibliographic Details
Published in:Materials science in semiconductor processing 2022-11, Vol.151, p.106988, Article 106988
Main Authors: Kim, Jisoo, Gong, Jiarui, Lin, Wei, Lal, Shalini, Su, Xin, Vincent, Daniel, Cho, Sang June, Zhou, Jie, Min, Seunghwan, Kim, Donghyeok, Ma, Zhenqiang
Format: Article
Language:English
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ISSN:1369-8001
DOI:10.1016/j.mssp.2022.106988