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Simulation and preparation of hybrid one dimensional photonic crystal containing phase transition vanadium dioxide

Reflectance curve and internal power distribution of one-dimensional photonic crystal constructed with germanium (Ge) and zinc sulfide (ZnS) were calculated and analyzed. Phase transition vanadium dioxide (VO2) was then introduced into this multilayer, and the average reflectance of the hybrid struc...

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Bibliographic Details
Published in:Optical materials 2020-11, Vol.109, p.110275, Article 110275
Main Authors: Kui Zhang, Ji, Ming Shi, Jia, Li, Ming, Liu, Biao
Format: Article
Language:English
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Summary:Reflectance curve and internal power distribution of one-dimensional photonic crystal constructed with germanium (Ge) and zinc sulfide (ZnS) were calculated and analyzed. Phase transition vanadium dioxide (VO2) was then introduced into this multilayer, and the average reflectance of the hybrid structure between 3 and 5 μm reaches 89.15%, and then decreases to 66.45% after VO2 transferred to the metallic phase. The introduction of VO2 bring a clear boundary in the power distribution inside the structure. physical vapor deposition (PVD) and spin-coating method (SCM) were applied in the deposition of this multilayer. Testing results like microscopic scanning electron microscopy (SEM) show a high accordance with that of design. X-ray diffraction (XRD) technology was also applied and confirmed the existence of monoclinic VO2. The phase transition induced thermal effect was studied by analyzing radiant temperatures and hemispherical band emissivity. •Our research combines one dimensional photonic crystal metamaterials with phase-transition vanadium dioxide to achieve novel effects.•Reflectance and power distribution are simulated and analyzed, providing an insight to understanding the role of vanadium oxide in tunable photonic crystal.•PVD and SCM were adopted to prepare this sample. The characteristics were tested with SEM and XRD technologies, proving the existence of phase-transition VO2 and the effectiveness of deposition methods.
ISSN:0925-3467
1873-1252
DOI:10.1016/j.optmat.2020.110275