Molecular beam epitaxy of β - FeSi 2 films on Si(111) substrates and its influence on minority-carrier diffusion length of Si measured by EBIC

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Bibliographic Details
Published in:Physics procedia 2011, Vol.11, p.23-26
Main Authors: Kawakami, H., Suzuno, M., Akutsu, K., Chen, J., Fuxing, Y., Sekiguchi, T., Suemasu, T.
Format: Article
Language:English
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ISSN:1875-3892
1875-3892
DOI:10.1016/j.phpro.2011.01.029