Effect of the Temperature on ZnO Thin Films Deposited by r.f. Magnetron

A thin zinc oxide (ZnO) films have been deposited by r.f. magnetron with Zinc target. The effect of the substrate temperature on the film crystalline quality have been studied in this work. The deposition temperature have been varied between ambient temperature to 760°C. We characterized by X-ray di...

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Bibliographic Details
Published in:Physics procedia 2014, Vol.55, p.144-149
Main Authors: Bensmaine, S., Benyoucef, B.
Format: Article
Language:English
Subjects:
sputtering
substrate temperature
thin film Zinc Oxide
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Summary:A thin zinc oxide (ZnO) films have been deposited by r.f. magnetron with Zinc target. The effect of the substrate temperature on the film crystalline quality have been studied in this work. The deposition temperature have been varied between ambient temperature to 760°C. We characterized by X-ray diffraction (XRD) the film crystallography and by scanning electron microscopy (SEM) the film morphology. The film thickness was measured by surface profilometer (Dektak ST3). The XRD analysis has revealed that the ZnO film exhibit a high c-axis orientation. The ZnO films grown at the ambient temperature are most weakly crystallized and a better crystalline quality is obtained for the 400°C and 100W. SEM image has shown a columnar structure of the ZnO films. Energy Dispersive X-ray spectroscopy (EDXS) characterization revealed the atomic compositions.
ISSN:1875-3892
1875-3892
DOI:10.1016/j.phpro.2014.07.021