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Effect of growth temperature on gallium nitride nanostructures using HVPE technique

The growth of hexagonal wurzite one dimensional (1D) gallium nitride (GaN) nanostructures on sapphire substrates using hydride vapor phase epitaxy (HVPE) process was carried out at two different temperatures (973K and 1023K). The GaN nanoneedles were formed at 973K and hexagonal nanorods get formed...

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Bibliographic Details
Published in:Physica. E, Low-dimensional systems & nanostructures Low-dimensional systems & nanostructures, 2012-06, Vol.44 (9), p.1885-1888
Main Authors: Munawar Basha, S., Ryu, S.R., Kang, T.W., Srivastava, O.N., Ramakrishnan, V., Kumar, J.
Format: Article
Language:English
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Summary:The growth of hexagonal wurzite one dimensional (1D) gallium nitride (GaN) nanostructures on sapphire substrates using hydride vapor phase epitaxy (HVPE) process was carried out at two different temperatures (973K and 1023K). The GaN nanoneedles were formed at 973K and hexagonal nanorods get formed at 1023K. The morphologies of these nanostructures were studied using high resolution scanning electron microscope. X-ray diffraction and micro-Raman spectroscopy measurements confirmed that the as grown GaN nanostructures are of hexagonal wurtzite structure without any oxide phase. The emission properties of these nanostructures have been investigated using photoluminescence. ► Growth of GaN nanostructures. ► Effect of temperatures on nanostructure growth. ► Structural and optical properties of growth structures.
ISSN:1386-9477
1873-1759
DOI:10.1016/j.physe.2012.05.014