Determination of Optical and Physical Properties of ZrO2 Films by Spectroscopic Ellipsometry

Film characterization based on spectroscopic ellipsometry (SE) is desirable in order to understand physical and optical characteristics of films. In this work, ZrO2 films were deposited on Si substrates by d.c. reactive magnetron sputtering with deposition times from 4 to 7 hr. The film thickness de...

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Bibliographic Details
Published in:Procedia engineering 2012, Vol.32, p.745-751
Main Authors: Yusoh, R., Horprathum, M., Eiamchai, P., Chindaudom, P., Aiempanakit, K.
Format: Article
Language:English
Subjects:
d.c. reactive magnetron sputtering
spectroscopic ellipsometry
ZrO2 films
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Summary:Film characterization based on spectroscopic ellipsometry (SE) is desirable in order to understand physical and optical characteristics of films. In this work, ZrO2 films were deposited on Si substrates by d.c. reactive magnetron sputtering with deposition times from 4 to 7 hr. The film thickness determined by SE technique was compared to field emission scanning electron microscopy (FE-SEM) results. From SE modelling process, the double-layer physical model and the Tauc-Lorentz for two oscillator dispersion models offered the best result. The refractive index at photon energy of 2.25eV of the film was decreased from 2.14 to 2.08 with time of 4 to 7 hr, respectively. The optical band gap of films was found to be in the range of 5.25-5.3eV. Finally, the film thickness was determined by SE technique which the result showed the thickness values of all films closely to the film thickness measured by FESEM technique.
ISSN:1877-7058
1877-7058
DOI:10.1016/j.proeng.2012.02.007