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Ferrofluidic masking of solid state nuclear track detectors during etching

This work presents a novel method for determining bulk etch rate of CR-39 during prolonged etching by masking the surface with a ferrofluidic film held in position by magnetostatic forces. The CR-39 etching conditions were 6.25 M NaOH solution for 24 h at temperatures ranging from 50 to 80 °C. After...

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Bibliographic Details
Published in:Radiation measurements 2009-02, Vol.44 (2), p.173-175
Main Authors: Springham, S.V., Malik, F., Roshan, M.V., Talebitaher, A.R., Rawat, R.S., Lee, P.
Format: Article
Language:English
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Summary:This work presents a novel method for determining bulk etch rate of CR-39 during prolonged etching by masking the surface with a ferrofluidic film held in position by magnetostatic forces. The CR-39 etching conditions were 6.25 M NaOH solution for 24 h at temperatures ranging from 50 to 80 °C. After etching, the heights of the resulting un-etched plateaus were measured using a Talyscan 150 profilometer. The removed layer thicknesses ranged from 12 to 85 μm, giving corresponding bulk etch rates in the range 0.5–3.54 μm/h.
ISSN:1350-4487
1879-0925
DOI:10.1016/j.radmeas.2009.01.007