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Ferrofluidic masking of solid state nuclear track detectors during etching
This work presents a novel method for determining bulk etch rate of CR-39 during prolonged etching by masking the surface with a ferrofluidic film held in position by magnetostatic forces. The CR-39 etching conditions were 6.25 M NaOH solution for 24 h at temperatures ranging from 50 to 80 °C. After...
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Published in: | Radiation measurements 2009-02, Vol.44 (2), p.173-175 |
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Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | This work presents a novel method for determining bulk etch rate of CR-39 during prolonged etching by masking the surface with a ferrofluidic film held in position by magnetostatic forces. The CR-39 etching conditions were 6.25
M NaOH solution for 24
h at temperatures ranging from 50 to 80
°C. After etching, the heights of the resulting un-etched plateaus were measured using a Talyscan 150 profilometer. The removed layer thicknesses ranged from 12 to 85
μm, giving corresponding bulk etch rates in the range 0.5–3.54
μm/h. |
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ISSN: | 1350-4487 1879-0925 |
DOI: | 10.1016/j.radmeas.2009.01.007 |