Kinetics of growth of thin-films of Co 2 Si, Ni 2 Si, WSi 2 and VSi 2 during a reactive diffusion process

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Bibliographic Details
Published in:Results in physics 2016, Vol.6, p.43-47
Main Authors: Akintunde, S.O., Selyshchev, P.A.
Format: Article
Language:English
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ISSN:2211-3797
2211-3797
DOI:10.1016/j.rinp.2016.01.006