Effects of boron addition on the high temperature oxidation of MoSi2 alloys

Boron containing MoSi2 is a promising material for applications at high temperature, but the oxidation mechanism is still unclear. In this work, the high temperature (1100 °C) oxidation of B doped MoSi2 in synthetic air has been investigated. A (boro)silicate layer is formed on the surface of the al...

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Bibliographic Details
Published in:Scripta materialia 2023-09, Vol.234, p.115580, Article 115580
Main Authors: Ding, Zhaoying, Brouwer, Johannes C., Zhu, Jia-Ning, Popovich, Vera, Hermans, Marcel J.M., Sloof, Willem G.
Format: Article
Language:English
Subjects:
Boron
Kinetics
MoSi2
Oxidation
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Summary:Boron containing MoSi2 is a promising material for applications at high temperature, but the oxidation mechanism is still unclear. In this work, the high temperature (1100 °C) oxidation of B doped MoSi2 in synthetic air has been investigated. A (boro)silicate layer is formed on the surface of the alloy, which features a mixture of amorphous SiO2 and cristobalite. After an initial transient period, the oxidation kinetics follows a parabolic growth rate law. The growth rate constant of the oxide layer is enhanced by the boron in the alloy by 90 % per at.% B. The increase in growth rate is associated with boron mitigating the formation of cristobalite thereby promoting the formation of amorphous SiO2. [Display omitted]
ISSN:1359-6462
1872-8456
DOI:10.1016/j.scriptamat.2023.115580