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Recent advances in titanium-based boron-doped diamond electrodes for enhanced electrochemical oxidation in industrial wastewater treatment: A review

Today, the freshwater supply has become one of the most significant global challenges due to the increasing world population. Various wastewaters, which contain high concentrations of pollutants have detrimental effects on the environment and human health. To tackle this issue, advanced electrochemi...

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Bibliographic Details
Published in:Separation and purification technology 2025-06, Vol.358, p.130218, Article 130218
Main Authors: Mehrkhah, Roya, Hadavifar, Mojtaba, Mehrkhah, Mitra, Baghayeri, Mehdi, Lee, Byoung Ho
Format: Article
Language:English
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Summary:Today, the freshwater supply has become one of the most significant global challenges due to the increasing world population. Various wastewaters, which contain high concentrations of pollutants have detrimental effects on the environment and human health. To tackle this issue, advanced electrochemical oxidation (AECO) processes have been widely utilized due to their effectiveness, environmental compatibility, and versatility. However, the efficiency of the AECO process is greatly influenced by the surface properties of anode materials, including electrode lifespan, adsorption properties, and operating costs. Boron-doped diamond (BDD) is an ideal anode material that is commonly used for the electrocatalytic degradation of environmental pollutants. Moreover, substrate materials that support BDD films can affect the current efficiencies, electricity consumption, and overall lifespan of the electrode during the electrochemical oxidation of pollutants. Titanium is regarded as a highly promising material for various applications, owing to its excellent conductivity, large surface area, affordability, and remarkable corrosion resistance. The objective of this article is to present a comprehensive review of recent advancements in enhancing the performance of titanium-based BDD electrodes for industrial wastewater treatment.
ISSN:1383-5866
DOI:10.1016/j.seppur.2024.130218