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Evaluation of an InAs HEMT with source-connected field plate for high-speed and low-power logic applications
•We have edited the highlights as below and attached.•InAs HEMTs electrical performance improvement by SCFP.•SS of 76 mV/dec, DIBL of 44 mV/V, and Ion/Ioff of 2.4 × 104 were achieved.•A high off-state breakdown voltage was achieved.•fT and fMAX of 113 GHz were demonstrated. In this study, we have pr...
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Published in: | Solid-state electronics 2019-07, Vol.157, p.55-60 |
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Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | •We have edited the highlights as below and attached.•InAs HEMTs electrical performance improvement by SCFP.•SS of 76 mV/dec, DIBL of 44 mV/V, and Ion/Ioff of 2.4 × 104 were achieved.•A high off-state breakdown voltage was achieved.•fT and fMAX of 113 GHz were demonstrated.
In this study, we have presented a source-connected field plate (SCFP) InAs high electron mobility transistor (HEMT) and evaluated its potential for using in high-speed and low-power logic applications. The fabricated device demonstrated good electrical characteristics including low subthreshold swing (SS) of 76 mV/decade, drain induced barrier lowering (DIBL) of 44 mV/V, ION/IOFF ratio of 2.4 × 104, an off-state gate leakage current of less than 5 × 10−6 A/mm and a Gm,max of 1100 mS/mm at VDS = 0.5 V. When increasing the drain-source bias (VDS) to 1.0 V, the Gm,max increased to 1750 mS/mm with a cut-off frequency of 113 GHz. These results revealed that the fabrication of source-connected field plate InAs HEMTs achieved excellent device performance for high-speed and low-power logic applications. |
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ISSN: | 0038-1101 1879-2405 |
DOI: | 10.1016/j.sse.2019.03.060 |