VHF SiH4/H2 plasma characteristics with negative ions

A VHF SiH4/H2 plasma was produced using a multi rod electrode and the plasma parameters were measured using a heated Langmuir probe, where the frequency of the power source was 80MHz. The Langmuir probe characteristics indicated that when the concentration of SiH4/H2 is increased, negative ions appe...

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Bibliographic Details
Published in:Surface & coatings technology 2013-08, Vol.228, p.S433-S436
Main Authors: Yamane, Tsukasa, Nakao, Sachiko, Takeuchi, Yoshiaki, Yamauchi, Yasuhiro, Takatsuka, Hiromu, Muta, Hiroshi, Uchino, Kiichiro, Kawai, Yoshinobu
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Negative ion
Physics
Sheath potential
Solar cell
Surface treatments
VHF plasma
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Summary:A VHF SiH4/H2 plasma was produced using a multi rod electrode and the plasma parameters were measured using a heated Langmuir probe, where the frequency of the power source was 80MHz. The Langmuir probe characteristics indicated that when the concentration of SiH4/H2 is increased, negative ions appear and at the same time the electron temperature increases. ► VHF SiH4/H2 plasma was produced using a multi rod electrode of 422mm×422mm. ► The sheath potential was lower than the calculated one for SiH4/H2 of 30%. ► The electron temperature increased to (4–4.5) eV for SiH4/H2 of 30%. ► The probe characteristics indicated the existence of negative ions for 30%.
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2012.05.036