Preparation and formation mechanism of smooth and uniform Cu2O thin films by electrodeposition method

• Published in: Surface & coatings technology 2013-02, Vol.216, p.166-171
• Main Authors: Xue, Jinbo, Shen, Qianqian, Liang, Wei, Liu, Xuguang, Bian, Liping, Xu, Bingshe
• Format: Article
• Language: English
• Subjects: Applied sciences; Cross-disciplinary physics: materials science; rheology; Cu2O thin film; Electrodeposition; Exact sciences and technology; Materials science; Metallic coatings; Metals. Metallurgy; Methods of deposition of films and coatings; film growth and epitaxy; Microstructure; Optical properties; Physics; Production techniques; Surface treatment; Surface treatments
• ISSN: 0257-8972; 1879-3347
• DOI: 10.1016/j.surfcoat.2012.11.051

Smooth and uniform Cu2O thin films were prepared by electrodeposition on Sn-doped indium oxide substrates (ITO) in Cu(Ac)2 electrolytes with thiourea addition. The influence of deposition potential and thiourea concentration on the formation of these thin films was investigated by using X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM) and atomic force microscopy (AFM). The results show that smooth and uniform Cu2O thin films were achieved by electrodeposition under the potential of −0.1V (vs. SCE) with 0.5mM thiourea, which exhibited obvious absorbance and photocurrent response in visible light range. In addition, as the concentration of thiourea increased, the density of Cu2O thin films decreased. Based on this, the thiourea assisted growth process was proposed as a plausible mechanism for the formation of smooth and uniform Cu2O thin films. [Display omitted] ► We prepared smooth and uniform Cu2O films by electrochemical method. ► We found that the thiourea play an important role in the films. ► The films exhibited obvious absorbance and photocurrent response in visible light range. ► The films have great application prospects in solar cell fields.