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Modeling electrical characteristics of thin-film field-effect transistors
The thin-film field-effect-transistor model recently developed is applied to devices based on materials that already show current even without a bias present at the gate resulting in so-called normally-on transistors. These fall in three categories: (i) narrow-band-gap semiconductors, where the ther...
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Published in: | Synthetic metals 2008-07, Vol.158 (11), p.473-478 |
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Main Authors: | , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The thin-film field-effect-transistor model recently developed is applied to devices based on materials that already show current even without a bias present at the gate resulting in so-called normally-on transistors. These fall in three categories: (i) narrow-band-gap semiconductors, where the thermal energy is sufficient to excite carriers across the band-gap, here analyzed for unipolar and ambipolar materials, (ii) doped semiconductors, and (iii) metals. It is shown what the impact is on the IV and transfer curves. |
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ISSN: | 0379-6779 1879-3290 |
DOI: | 10.1016/j.synthmet.2008.03.011 |