Chemical dry etching of silicon oxide in F2/Ar remote plasmas

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Bibliographic Details
Published in:Thin solid films 2007-04, Vol.515 (12), p.4945-4949
Main Authors: KANG, S. C, KIM, D. J, HWANG, J. Y, YUN, Y. B, LEE, N.-E, JANG, Y. C, BAE, G. H
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Etching and cleaning
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma applications
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2006.10.030